Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications
Жанр: Образовательная литература, № 768 в Зарубежная образовательная литература
Издательство:
John Wiley & Sons Limited
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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology.
The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. На нашем сайте вы можете скачать книгу "Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications" David Cameron в формате pdf, читать книгу онлайн или купить книгу в интернет-магазине.
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